C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/34 (2006.01) C23C 14/06 (2006.01) G02B 1/10 (2006.01) G02B 1/12 (2006.01)
Patent
CA 2525061
In the process according to the invention carried out by means of the apparatus according to the invention, a transition layer (12), which is used to match mechanical properties of a substrate (10) to mechanical properties of a layer system (16) to be applied above the transition layer (12), is deposited on a front surface (20) of the substrate (10). For this purpose, during a sputtering process carried out in a vacuum chamber (18), reaction products (14) are incorporated at least virtually exclusively in the transition layer (12). This prevents other surfaces of the vacuum chamber (18) and a rear side (34) of the substrate (10) from being contaminated with the reaction products (14) and/or their precursors.
Fetherstonhaugh & Co.
Satisloh Ag
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