G - Physics – 02 – B
Patent
G - Physics
02
B
88/0.1, 95/94.4
G02B 1/00 (2006.01) G02B 5/00 (2006.01) G02B 27/42 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01)
Patent
CA 1140373
ABSTRACT OF THE DISCLOSURE A process for casting on a support the faithful shadow of a mask pierced with periodically distributed slits. This process is particularly useful in photolitho- graphy. In the process the wavelength of a flat incident wave is chosen so that there exist only two diffracted orders for each of the two half-spaces defined by each slit and which are situated on each side of a mean plane of the mask midway between the exterior surfaces thereof. The angle of incidence of the flat wave is adjusted so that the reflected diffracted order which is not the specularly reflected order is propagated in the direction of the incident wave but in the opposite direction.
359986
Neviere Michel
Roumiguieres Jean-Louis
Fetherstonhaugh & Co.
Roumiguieres Jean-Louis
LandOfFree
Process for casting on a support the faithful shadow of a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for casting on a support the faithful shadow of a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for casting on a support the faithful shadow of a... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-611167