Process for cleaning a substrate

Details Process for cleaning a substrate Process for cleaning a substrate

C - Chemistry, Metallurgy

11

D

C11D 17/00 (2006.01) C11D 3/00 (2006.01) C11D 3/18 (2006.01) C11D 3/24 (2006.01) C11D 3/37 (2006.01) C11D 3/43 (2006.01) C11D 11/00 (2006.01) D06L 1/02 (2006.01) D06L 1/04 (2006.01)

Patent

CA 2464313

A process of cleaning a substrate, the process comprising the steps of contacting a substrate with a composition comprising at least two liquids mutually presenting a liquid-liquid interface with an interfacial tension of at least 5 mN/m and agitating the substrate and/or composition whilst they are in mutual contact, wherein the composition and/or the substrate are also subjected to ultrasound before and/or during the agitation step.

L'invention concerne un procédé permettant de nettoyer un substrat. Ledit procédé consiste à mettre en contact un substrat et une composition comprenant au moins deux liquides présentant mutuellement une interface liquide-liquide dont la tension interfacielle est d'au moins 5 mN/m, et à agiter le substrat et/ou la composition pendant qu'ils sont mutuellement en contact, ladite composition et/ou ledit substrat étant également soumis à des ultrasons avant et/ou pendant l'étape d'agitation.

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