Process for cleaning copper-containing metal surfaces

Details Process for cleaning copper-containing metal surfaces Process for cleaning copper-containing metal surfaces

H - Electricity

05

K

356/12, 96/256

H05K 3/26 (2006.01) C23G 1/00 (2006.01) C23G 1/10 (2006.01) C25D 5/34 (2006.01) G03F 7/42 (2006.01)

Patent

CA 1147246

Abstract of the Disclosure A process and an aqueous treatment solution for cleaning copper surfaces, In particular for removing residues of photore- sist layers which residues still adhere after development to the cleared copper areas, are described The solution contains a water-soluble aliphatic sulfonic acid having 8 to 30 carbon atoms or a water-soluble salt thereof.

337380

Affiliated with

Also associated with

Rating

Process for cleaning copper-containing metal surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for cleaning copper-containing metal surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for cleaning copper-containing metal surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-308121