Process for controlling an installation for plasma treatment...

H - Electricity – 05 – H

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H05H 1/00 (2006.01) H01J 37/32 (2006.01) H05H 1/36 (2006.01) H05H 1/48 (2006.01)

Patent

CA 2075299

2075299 9112628 PCTABS00006 The invention relates to a process for controlling an installation for plasma treatment of workpieces. The installation has a constant voltage source for producing a glow discharge voltage V, which includes a control unit for controlling the magnitude of the glow discharge voltage V and a switch unit which can periodically switch off the glow discharge voltage V in various pulse-pause ratios. The installation also has a sensor for measuring the temperature of the workpiece, which is connected to the control unit so that the glow discharge voltage V is increased if the measured temperature is less than a given treatment temperature and decreased if the measured temperature is greater than the treatment temperature. The glow discharge voltage V is monitored so that if it falls below a lower threshold value the pulse-pause ratio of the glow discharge voltage V is reduced and if it exceeds an upper threshold value the pulse-pause ratio is increased.

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