Process for depositing a different thin film on an oxide...

Details Process for depositing a different thin film on an oxide... Process for depositing a different thin film on an oxide...

H - Electricity

01

L

H01L 39/24 (2006.01)

Patent

CA 2047001

Improvement in a process for depositing a thin film on an oxide superconductor thin film deposited previously on a substrate. A surface of the thin film of oxide superconductor is irradiated with laser beam pulses in high-vacuum of lower than 1 x 10-6 Torr before said another thin film is deposited thereon. The invention is applicable to fabrication of electronics devices such as Josephson element or superconducting transistors.

Affiliated with

Also associated with

Rating

Process for depositing a different thin film on an oxide... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for depositing a different thin film on an oxide..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for depositing a different thin film on an oxide... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-2032910