Process for drying metal surfaces using gaseous hydrides to...

Details Process for drying metal surfaces using gaseous hydrides to... Process for drying metal surfaces using gaseous hydrides to...

C - Chemistry, Metallurgy

23

C

C23C 8/06 (2006.01) F26B 21/14 (2006.01)

Patent

CA 2070504

ABSTRACT OF THE DISCLOSURE A process for drying a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises: a) purging gas in contact with said metal surface with inert gas to remove the purged gas, b) exposing the metal surface to an amount of a drying agent comprising an effective amount of gaseous hydride of silicon, germanium, tin or lead, and for a time sufficient to dry the metal surface, and c) purging the drying agent using inert gas.

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