H - Electricity – 02 – N
Patent
H - Electricity
02
N
H02N 13/00 (2006.01) H01L 21/68 (2006.01) H01L 21/683 (2006.01)
Patent
CA 2350653
The invention concerns an electrostatic maintaining device particularly designed for maintaining wafers made of conductor or semiconductor material such as silicon while they are being subjected to micromachining processes or any other type of treatment such as plasma treatment in a vacuum chamber for instance. The device consists of an electrically insulating surface beneath which are arranged at least two electrodes. The electrodes are powered by a direct current whereof the polarities are periodically inverted so as to release the accumulated static charges.
La présente invention concerne un dispositif de maintien électrostatique particulièrement destiné au maintien de plaquettes de matériaux conducteurs ou semi-conducteurs tels que le silicium pendant qu'elles subissent des micro-usinages ou tout autre type de traitement comme des traitements au plasma dans une enceinte sous vide par exemple. A cet effet, le dispositif est composé d'une surface électriquement isolante sous laquelle sont disposées au moins deux électrodes. Les électrodes sont alimentées par un courant continu dont les polarités sont périodiquement inversées afin de libérer les charges électrostatiques accumulées.
Claude Richard
Hale William
Hernandez Jose
Pellegrin Yvon
Robic
Semco Engineering S.a.
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