Process for fabrication of optical waveguides

G - Physics – 02 – B

Patent

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G02B 6/12 (2006.01) G02B 6/138 (2006.01)

Patent

CA 2507533

A method for manufacturing an optical waveguide device in accordance with the present invention includes the steps of depositing a lower cladding layer (114); coating a photoresist layer (118) directly on the lower cladding layer; patterning the photoresist layer to create channels (117); depositing a core layer (116), wherein a first portion of the core layer is deposited inside the channels and a second portion overlays the patterned photoresist layer; removing the patterned photoresist layer and the second portions of the core layer overlaying the patterned photoresist layer; and depositing an upper cladding layer (120).

L'invention concerne un procédé de fabrication d'un dispositif de guide d'ondes optique, qui comporte les étapes consistant à déposer une couche gaine (114) inférieure ; appliquer une couche (118) de résine photosensible directement sur la couche gaine inférieure ; former des motifs sur la couche de résine photosensible afin de produire des canaux (117) ; déposer une couche coeur (116), une première partie de cette couche étant déposée dans les canaux et une seconde partie recouvrant la couche de résine photosensible comportant les motifs ; éliminer la couche de résine photosensible comportant les motifs et les secondes parties de la couche coeur recouvrant celle-ci ; et déposer une couche gaine (120) supérieure.

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