Process for formation of a relief image by applying suction...

Details Process for formation of a relief image by applying suction... Process for formation of a relief image by applying suction...

G - Physics

03

C

96/153, 345/28

G03C 5/00 (2006.01) G03F 7/027 (2006.01)

Patent

CA 1089695

ABSTRACT OF THE DISCLOSURE A novel photosensitive composition and its use are described. The novel composition is a liquid composi- tion comprising at least one addition polymerizable unsatur- ated monomer having at least one acryloyl or methacryloyl group per each molecule and a molecular weight of not more than about 1000 per each acryloyl or methacryloyl group and at least one photopolymerization initiator, and being substantially free of unsaturated polymeric material. To form a relief image, a layer of the composition on a support surface is exposed to light through a negative to cure the photosensitive composition at the exposed parts, with the non-cured composition at the non-exposed parts being removed by suction.

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