Process for formation of oxide thin film

Details Process for formation of oxide thin film Process for formation of oxide thin film

C - Chemistry, Metallurgy

23

C

C23C 14/28 (2006.01) H01L 39/24 (2006.01)

Patent

CA 2188902

A process for formation of oxide thin film, which comprises applying a laser beam on a target oxide material to generate a vapor therefrom and depositing the vapor on a substrate to form an oxide thin film on the substrate, wherein the formation of an oxide thin film on the substrate is conducted by disposing the target and the substrate face to face, scanning the laser beam applied onto the target, in a direction normal to the target central axis, and rotating the substrate.

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