Process for forming passivated film

C - Chemistry – Metallurgy – 23 – C

Patent

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C23C 8/14 (2006.01)

Patent

CA 2100751

Abstract A process for a passivated film which is far reduced in the amount of gas discharge and can desorb an adsorbed gas more readily, which process comprises heating a stainless member with a surface roughness, Rmax, of 1.0µ m or less in an atmosphere of a mixture comprising oxygen gas and an inert gas and having a dew point of -95°C or below, an impurity concentration of 10 ppb or less and an oxygen content 5ppm 25 vol% at 300 to 420 °C.

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