Process for forming semiconductor film and device used therefor

Details Process for forming semiconductor film and device used therefor Process for forming semiconductor film and device used therefor

B - Operations, Transporting

05

D

204/182, 204/96.

B05D 3/06 (2006.01)

Patent

CA 1251163

Abstract of the disclosure A process for forming a film, which comprises, in a forming film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs arranged in a line are arranged in parallel and substrates are arranged on both sides of the electrode pair row substantially in parallel to the electrode pair row. According to the process, damage caused by plasma to thin films can be minimized and there is not required a shield on the back of the RF electrode, while making it possible to obtain a thin film of large area.

479705

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