Process for high-yield synthesis of standard length and...

Details Process for high-yield synthesis of standard length and... Process for high-yield synthesis of standard length and...

C - Chemistry, Metallurgy

12

Q

C12Q 1/68 (2006.01) B01J 19/00 (2006.01) C07H 21/00 (2006.01) C07K 1/04 (2006.01) C07K 17/00 (2006.01)

Patent

CA 2490675

Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.

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