Process for making electrode with integral dielectric layer

C - Chemistry – Metallurgy – 23 – F

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C23F 1/02 (2006.01) H05K 3/06 (2006.01) H05K 1/16 (2006.01) H05K 3/00 (2006.01) H05K 3/38 (2006.01)

Patent

CA 1113296

PROCESS FOR MAKING ELECTRODE WITH INTEGRAL DIELECTRIC LAYER ABSTRACT OF THE INVENTION A process of fabricating switching device elec- trodes with an integral dielectric layer. The method permits the dielectric layer to serve also as the photoresist during the electrode etching step of the process.

305740

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