Process for making semiconductor devices using...

Details Process for making semiconductor devices using... Process for making semiconductor devices using...

H - Electricity

01

L

356/177

H01L 21/42 (2006.01) C07F 7/18 (2006.01) C07J 51/00 (2006.01) G03F 7/004 (2006.01)

Patent

CA 1219686

- 20 - Abstract This invention relates to a process for preparing a semiconductor device comprising the steps of depositing a photosensitive material on a substrate, irradiating the photosensitive material in a desired pattern, developing the pattern and completing the fabrication of the device. The photosensitive material that is sensitive to ultraviolet radiation and that exhibits excellent contrast is formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

452061

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