Process for measuring the depth of a microstructure

Details Process for measuring the depth of a microstructure Process for measuring the depth of a microstructure

G - Physics

01

B

G01B 11/22 (2006.01)

Patent

CA 2194883

The proposal is for a process for measuring the depth of a microstructure on the transfer of the structure by means of a stamping process into a deformable layer, in which there is a geometrically simple reference grid structure in the microstructure to be transferred. This reference grid structure causes an interference of a measuring light beam. The colour distribution thus produced provides a measure of the structure depth obtained.

L'invention concerne un procédé qui permet de mesurer la profondeur d'une microstructure lors du transfert par estampage de la structure dans une couche déformable. Il est prévu une structure réticulaire de référence, de forme géométrique simple dans la microstructure à transférer. Cette structure réticulaire de référence provoque une interférence d'un rayon lumineux de mesure. La répartition des couleurs qui en résulte fournit alors une grandeur de la profondeur de la structure obtenue.

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