Process for measuring thickness of very thin moving films

Details Process for measuring thickness of very thin moving films Process for measuring thickness of very thin moving films

G - Physics

01

B

73/54

G01B 11/04 (2006.01) G01B 11/06 (2006.01) G01N 21/55 (2006.01)

Patent

CA 1127864

PROCESS FOR MEASURING THICKNESS OF VERY THIN MOVING FILMS Abstract of the Disclosure The thickness of very thin dielectric films covering metal surfaces are measured while the surface and the film are in motion. This is accomplished by spacing a prism very close to the moving film, passing light which is polarized in the plane of incidence into said prism at various angles of incidence to generate surface plasma oscillations on the film-metal layer interface and thereby attenuating reflectivity, then measuring said reflectivity as a function of the angle of incidence, determining that angle of incidence which produces the minimum reflectivity and comparing that angle of incidence to a previously determined standard to measure the film thickness. SA978069

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