Process for obtaining high purity silica

Details Process for obtaining high purity silica Process for obtaining high purity silica

C - Chemistry, Metallurgy

01

B

23/192

C01B 33/187 (2006.01) C01B 33/12 (2006.01) C01B 33/18 (2006.01)

Patent

CA 1184740

ABSTRACT OF THE DISCLOSURE A method of producing high purity silica containing less than 2 ppm iron oxides and less than 50 ppm alumina from particulate silica or quartz concentrates containing both sur- face and occluded mineral impurities wherein the concentrate is agitated with an aqueous solution containing 3-20% by weight hydrofluoric acid at a temperature between 50°C and the boiling point of the solution. The impurities dissolve at a greater rate than the silica and can be washed away or separated as a slime.

401560

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