Process for polishing semi-conductor material

Details Process for polishing semi-conductor material Process for polishing semi-conductor material

C - Chemistry, Metallurgy

09

K

57/10

C09K 13/06 (2006.01) C09G 1/02 (2006.01) C09G 1/04 (2006.01) H01L 21/306 (2006.01)

Patent

CA 1110145

ABSTRACT OF THE DISCLOSURE Semi-conductor can be polished with greater efficiency by using as a polishing agent a blend of colloidal silica or silica gel and a water- soluble amine.

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