C - Chemistry – Metallurgy – 12 – P
Patent
C - Chemistry, Metallurgy
12
P
195/97
C12P 35/00 (2006.01) C12P 35/02 (2006.01)
Patent
CA 1086668
ABSTRACT OF THE DISCLOSURE Compounds are provided having the general formula I: Image I wherein X represents hydroxyl group, an acetoxy group or a thiosulfuric acid residue. The formula I compounds are prepared from compounds of the general formula II: Image II wherein R1 represents hydrogen, a lower alkanoyl group, an arylalkanoyl group, an alkoxycarbonyl group, a lower haloalkoxy- carbonyl group, a substituted or unsubstituted aroyl group, an N-arylcarbamoyl group of a substituted or unsubstituted aryl group; R2 either represents hydrogen or, together with the R1-N- group, represents a phthalimido group; and X represents a hydroxyl group, an acetoxy group or a thiosulfuric acid residue, or their metal salts or their salts with organic bases, by causing the culture of a cephalosporin C acylase-producing strain of a microorganism, especially a mold, fungus, or the secondary preparation therefrom, to act on the latter compounds II in the presence of an aqueous medium.
278905
Goi Hitoshi
Kai Fumio
Miyadoh Shinji
Niida Taro
Niwa Tomizo
Marks & Clerk
Meiji Seika Kaisha Ltd.
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