Process for preparing a polymeric relief structure

Details Process for preparing a polymeric relief structure Process for preparing a polymeric relief structure

G - Physics

03

F

G03F 7/38 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2556684

The invention deals with a process for the preparation of a polymeric relief structure via electromagnetic radiation. In the process a compound is used that reduces the interfacial tension of the coated substrate. As a result the aspect ratio as well as the curvature of the surface are enhanced, and therefore are beneficial for optical components and for replication purposes.

La présente invention se rapporte à un procédé de préparation d'une structure polymère en relief qui fait appel à un rayonnement électromagnétique. Au cours de ce procédé, on utilise un composé qui réduit la tension interfaciale du substrat recouvert. Il est par conséquent possible d'accroître le facteur de forme ainsi que la courbure de la surface, ce qui est particulièrement intéressant dans le cas de composants optiques et à des fins de réplication.

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