Process for preparing high resolution emissive arrays and...

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H01J 9/227 (2006.01) B41M 5/26 (2006.01) H01L 51/40 (2006.01) H05B 33/10 (2006.01) B41M 5/00 (2006.01) B41M 5/40 (2006.01)

Patent

CA 2261109

A process is described for forming an emissive or phosphor screen. The process comprises the steps of: a) providing a thermal mass donor element comprising a substrate with a front side and a back side, with a coating of emissive material or phosphor adhered to said front side of said substrate; b) placing said coating of emissive material or phosphor adjacent to a support layer; c) addressing said mass donor element with coherent radiation to heat at least a portion of said coating of emissive material or phosphor to locally transfer at least some of said emissive material or phosphor to said support layer; d) repeating step c) a sufficient number of times to provide a coating of transferred emissive material or phosphor on said support layer in an area of at least 1 square centimeter.

La présente invention concerne un procédé de réalisation d'écrans émissifs ou luminescents. Ce procédé consiste: a) à déposer, sur un élément donneur à masse thermique comprenant un substrat caractérisé par une face antérieure et une face postérieure, une couche de matière émissive ou luminescente adhérant au substrat; b) à disposer une couche support contre la couche de matière émissive ou luminescente; c) à envoyer sur l'élément donneur à masse thermique un rayonnement cohérent permettant de chauffer une partie de la couche de matière émissive ou luminescente de façon à transférer localement sur la couche support une partie au moins de la couche de matière émissive ou luminescente; et d) à répéter l'opération c) plusieurs fois jusqu'à constituer sur la couche support une couche de matière émissive ou luminescente d'au moins 1cm?2¿.

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