Process for preparing improved tio2 by silicon halide addition

C - Chemistry – Metallurgy – 01 – G

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C01G 23/07 (2006.01) C09C 1/36 (2006.01)

Patent

CA 2190470

A process for producing substantially anatase-free TiO2 by addition of a silicon halide in a reaction of TiCl4 and an oxygen-containing gas in a plug flow reactor is disclosed. Pigmentary properties such as gloss and CBU are enhanced without loss of durability.

L'invention se rapporte à un procédé de production de TiO¿2? pratiquement exempt d'anatase par addition d'un halogénure de silicium au cours d'une réaction de TiCl¿4? avec un gaz contenant de l'oxygène dans un réacteur à écoulement idéal. Les propriétés pigmentaires, telles que la brillance et un sous-ton de noir de carbone, sont améliorées sans déperdition de durée de vie.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Process for preparing improved tio2 by silicon halide addition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing improved tio2 by silicon halide addition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing improved tio2 by silicon halide addition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-2074533

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.