C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/265.5
C07D 487/04 (2006.01) C07D 235/06 (2006.01)
Patent
CA 1119596
ABSTRACT OF THE DISCLOSURE; The present invention relates to a process for preparing new pyrroloquinoxalines of general formula I: Image (I) wherein X and Y, which may be the same or different, each represents a hydrogen or halogen atom, or a nitro radical; Z represents a straight or branched chain alkyl radical containing from 1 to 8 carbon atoms, a cycloalkyl radical containing from 3 to 8 carbon atoms, an alkenyl radical containing from 2 to 6 carbon atoms or a phenyl radical and R represents a hydrogen atom, a straight or branched chain alkyl radical containing from 1 to 5 carbon atoms and salts thereof. These compounds possess, in particular, an anti- allergic activity.
300989
Rowlands David A.
Taylor John B.
Robic Robic & Associes/associates
Roussel-Uclaf
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