Process for preparing positive resist composition

G - Physics – 03 – F

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96/156

G03F 7/023 (2006.01) C08G 8/10 (2006.01)

Patent

CA 2004593

ABSTRACT OF THE DISCLOSURE A process for preparing a positive resist com- position, which process comprises the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

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