G - Physics – 03 – F
Patent
G - Physics
03
F
96/156
G03F 7/023 (2006.01) C08G 8/10 (2006.01)
Patent
CA 2004593
ABSTRACT OF THE DISCLOSURE A process for preparing a positive resist com- position, which process comprises the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.
Hanamoto Yukio
Hioki Takeshi
Kuwana Kozi
Nakanishi Hirotoshi
Oi Fumio
Kirby Eades Gale Baker
Sumitomo Chemical Company Limited
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