C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 311/60 (2006.01) C07C 303/28 (2006.01) C07C 309/76 (2006.01) G03F 7/022 (2006.01)
Patent
CA 2065468
-15- ABSTRACT OF THE DISCLOSURE A radiation sensitive compound prepared by reac- ting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielect- ric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
Doi Yasunori
Hanawa Ryotaro
Kuwana Koji
Nakanishi Hirotoshi
Takagaki Hiroshi
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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