C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/305
C07D 233/64 (2006.01) C07D 233/54 (2006.01) C07D 277/22 (2006.01) C07D 277/26 (2006.01)
Patent
CA 1076581
ABSTRACT OF THE DISCLOSURE Pharmacologically active compounds are disclosed of the formula: Image wherein X is sulphur, CHNO2, N.CN or NH; Y is amino (except when X is N.CN), lower alkoxy, phenylethyl, imidazolylethyl, allyl, trifluoroethyl or (CH2)nR; Z is sulphur or methylene; Het is an imidazole, pyridine, thiazole, isothiazole, oxazole, isoxazole, triazole or thiadiazole ring which ring is optionally substituted by lower alkyl, hydroxy, halogen or amino; n is an integer from 1 to 12; and R is hydroxy, lower alkoxy, amino or lower alkylamino; provided that when X is NH, Y is trifluoroethyl or (CH2)nR. These compounds find use as histamine H2-antagonists.
252248
Durant Graham J.
Ganellin Charon R.
Owen Geoffrey R.
Young Rodney C.
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