H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 21/306 (2006.01) C25F 3/12 (2006.01) H01L 21/321 (2006.01) H01L 33/00 (2006.01)
Patent
CA 2315674
In a process for producing a porous layer by an electrochemical etching process, an etching mask which corresponds to the desired course of the deep- etching rate is used. For the course of the deep-etching rate to be continuous, a wedge-shaped etching mask can be selected.
L'invention concerne un procédé pour la production d'une couche poreuse par un processus de gravure électrochimique. On utilise à cet effet un masque de gravure correspondant à la courbe désirée de la vitesse de gravure profonde. On peut sélectionner un masque de gravure en forme de coin afin d'obtenir une courbe continue de la vitesse de gravure profonde.
Arens-Fischer Rudiger
Berger Michael
Kruger Michael
Luth Hans
Thonissen Markus
Forschungszentrum Julich Gmbh
Smart & Biggar
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