Process for producing a porous layer by an electrochemical...

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H01L 21/306 (2006.01) C25F 3/12 (2006.01) H01L 21/321 (2006.01) H01L 33/00 (2006.01)

Patent

CA 2315674

In a process for producing a porous layer by an electrochemical etching process, an etching mask which corresponds to the desired course of the deep- etching rate is used. For the course of the deep-etching rate to be continuous, a wedge-shaped etching mask can be selected.

L'invention concerne un procédé pour la production d'une couche poreuse par un processus de gravure électrochimique. On utilise à cet effet un masque de gravure correspondant à la courbe désirée de la vitesse de gravure profonde. On peut sélectionner un masque de gravure en forme de coin afin d'obtenir une courbe continue de la vitesse de gravure profonde.

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