Process for producing electrically impervious anodized films...

Details Process for producing electrically impervious anodized films... Process for producing electrically impervious anodized films...

C - Chemistry, Metallurgy

25

D

C25D 11/34 (2006.01) C25D 11/08 (2006.01) C25D 11/26 (2006.01) C25D 17/00 (2006.01)

Patent

CA 2091147

ABSTRACT OF DISCLOSURE A method is disclosed for producing an anodized film on titanium, its alloys and other metals such that the film deposited will have a specific leak rate of less than one nanoamp per square centimeter at room temperature with an impressed electric field of at least five volts, where the anodization is performed in a solution consisting of liquid ortho-phosphoric acid of reduced water content in an aprotic solvent, and articles of manufacture therefrom.

Affiliated with

Also associated with

Rating

Process for producing electrically impervious anodized films... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing electrically impervious anodized films..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing electrically impervious anodized films... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1907145