C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 9/08 (2006.01) C01B 25/10 (2006.01) C01B 33/107 (2006.01) C01B 35/06 (2006.01) C01G 17/04 (2006.01) C01G 28/00 (2006.01)
Patent
CA 2731786
Disclosed is a process for producing a fluoride gas that can produces fluoride gases such as BF3, SiF4, GeF4, PF5 or AsF5 at a reduced production cost in a simple manner. The process is characterized in that a compound containing an atom, which, together with a fluorine atom, can form a polyatomic ion, is added to a hydrogen fluoride solution to produce the polyatomic ion in a hydrogen fluoride solution and to evolve a fluoride gas comprising the fluorine atom and the atom that, together with the fluorine atom, can form a polyatomic ion.
L'invention porte sur un procédé de fabrication d'un fluorure gazeux qui permet de produire simplement des fluorures gazeux tels que BF3, SiF4, GeF4, PF5 ou AsF5 à coût réduit. Le procédé est caractérisé en ce qu'un composé contenant un atome qui, conjointement à un atome de fluor, peut former un ion polyatomique, est ajouté à une solution de fluorure d'hydrogène pour produire l'ion polyatomique dans une solution de fluorure d'hydrogène et dégager un fluorure gazeux comprenant l'atome de fluor et l'atome qui, conjointement à l'atome de fluor, peut former un ion polyatomique.
Hirano Kazutaka
Miyamoto Kazuhiro
Waki Masahide
Yabune Tatsuhiro
Marks & Clerk
Stella Chemifa Corporation
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