G - Physics – 03 – F
Patent
G - Physics
03
F
96/214, 204/96.2
G03F 7/115 (2006.01) G03F 7/075 (2006.01)
Patent
CA 1238879
ABSTRACT OF THE DISCLOSURE A process for producing a light-sensitive litho- graphic plate requiring no dampening solution comprising (1) carrying out corona discharge treatment on the surface of a silicone rubber layer of a light-sensitive lithographic plate requiring no dampening solution wherein the silicone rubber layer is the top layer, (2) spraying a solution or dispersion containing a non-volatile solid component on said silicone rubber layer, and (3) drying to provide fine projection patterns on said silicone rubber layer.
476245
Ohishi Chikashi
Shiba Keisuke
Takahashi Hiroshi
Tamaki Hiroyuki
Fuji Photo Film Co. Ltd.
Riches Mckenzie & Herbert Llp
LandOfFree
Process for producing light sensitive lithographic plate... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing light sensitive lithographic plate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing light sensitive lithographic plate... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1217768