C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/97, 204/97.0
C25D 9/00 (2006.01) C25D 13/00 (2006.01) C25D 13/10 (2006.01) G03G 5/05 (2006.01)
Patent
CA 2004789
ABSTRACT OF THE DISCLOSURE By electrotreating a dispersion or solution obtained by dispersing or dissolving hydrophobic substance powder in aqueous medium with the use of surfactant having a HLB value of 10.0 to 20.0, under the conditions for forming the thin film of said hydrophobic substance on the cathode, thin films of hydrophobic substance is formed on the cathode. In this way thin films of hydrophobic substance can be formed on base metals such as aluminum, which can be applied to photosensitive materials and the like.
Hoshino Katsuyoshi
Kokado Hiroshi
Saji Tetsuo
Yokoyama Seiichiro
Idemitsu Kosan Co. Ltd.
Riches Mckenzie & Herbert Llp
LandOfFree
Process for producing thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing thin films will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1424858