C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/12 (2006.01)
Patent
CA 2743246
A process for reducing waste and increasing yield of chlorosilane monomers is performed by cracking poly-chlorosiloxane and polychlorosilane by-products generated during production of trichlorosilane useful for the manufacture of polycrystalline silicon.
L'invention porte sur un procédé de réduction des rejets et d'augmentation du rendement de production de monomères chlorosilanes par craquage de sous-produits polychlorosiloxanes et polychlorosilanes générés pendant la fabrication de trichlorosilane utile pour la fabrication de silicium polycristallin.
Harder Patrick James
Tselepis Arthur James
Dow Corning Corporation
Gowling Lafleur Henderson Llp
Hemlock Semiconductor Corporation
LandOfFree
Process for producing trichlorosilane and tetrachlorosilane does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing trichlorosilane and tetrachlorosilane, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing trichlorosilane and tetrachlorosilane will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1953514