Process for producing trichlorosilane and tetrachlorosilane

C - Chemistry – Metallurgy – 07 – F

Patent

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C07F 7/12 (2006.01)

Patent

CA 2743246

A process for reducing waste and increasing yield of chlorosilane monomers is performed by cracking poly-chlorosiloxane and polychlorosilane by-products generated during production of trichlorosilane useful for the manufacture of polycrystalline silicon.

L'invention porte sur un procédé de réduction des rejets et d'augmentation du rendement de production de monomères chlorosilanes par craquage de sous-produits polychlorosiloxanes et polychlorosilanes générés pendant la fabrication de trichlorosilane utile pour la fabrication de silicium polycristallin.

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