Process for production of zeolite film

C - Chemistry – Metallurgy – 01 – B

Patent

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Details

C01B 39/38 (2006.01) B01D 69/10 (2006.01) B01D 71/02 (2006.01) C01B 37/02 (2006.01)

Patent

CA 2629813

A process for producing a zeolite membrane comprising a seed crystal forming step of placing, in a pressure-resistant vessel, a seeding sol containing silica, water and a structure-directing agent and a support in a state that the support is immersed in the seeding sol and heating the heat-resistant vessel to form a zeolite seed crystal on the surface of the support, and a membrane formation step of allowing the zeolite seed crystal to grow to form a zeolite membrane on the surface of the support. In the seed crystal forming step, the molar ratio of water/silica in the seeding sol is set 10 to 50 and the heating of the pressure-resistant vessel is conducted at 90 to 130°C. The crystal c-axis of the present zeolite membrane is oriented in a direction vertical to the surface of the support and its thickness is uniform.

L~invention concerne un processus de fabrication de film de zéolite, comprenant : une phase de génération de cristal d'ensemencement dans laquelle un sol d~ensemencement comprenant de la silice, de l~eau et un agent définissant une structure de même qu~un support sont placés dans une cuve résistant à la pression de façon à pouvoir immerger le support dans le sol d~ensemencement, et l~on chauffe l~intérieur de la cuve pour provoquer la génération d~un cristal d'ensemencement de zéolite à la surface du support ; et une phase de formation de film dans laquelle on laisse se développer le cristal d~ensemencement de zéolite pour constituer un film de zéolite à la surface du support, le rapport de l~eau dans le sol d~ensemencement à la silice dans la phase de génération de cristal d~ensemencement étant le suivant : eau/silice=10-50, et la température de chauffage de la cuve résistant à la pression étant de 90-130°C. Selon le processus, l~axe c du cristal de zéolite peut être orienté dans une direction verticale à la surface du support, et on peut obtenir ainsi un film de zéolite dont l~épaisseur est uniforme.

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