C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 15/013 (2006.01) B01J 45/00 (2006.01)
Patent
CA 2124546
Abstract of the Disclosure A process for purification of hydrogen peroxide is provided which comprises contacting an aqueous hydro- gen peroxide solution with a chelate resin. According to the process, it is possible to remove impurities in the aqueous hydrogen peroxide solution in high efficiency, and particularly, it is possible to remove iron, alumi- num, etc., which are difficult to remove singly by ion exchange resins, up to extremely low concentrations. Highly pure hydrogen peroxide solutions obtained by this invention can suitably used for washing of silicon wafers.
Sakaitani Hisashi
Sugihara Yasuo
Tanaka Kazushige
Mitsubishi Gas Chemical Company Inc.
Smart & Biggar
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