C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
18/1214, 402/488
C08F 6/00 (2006.01) C08F 12/08 (2006.01) C08F 279/02 (2006.01) C08K 5/43 (2006.01)
Patent
CA 1097848
ABSTRACT OF THE DISCLOSURE A process for removing residual monomer from styrene based polymers is disclosed which comprises adding a sulfonyl- hydrazide having the general formula: Image where: R1 is H or an alkyl radial containing 1 to 4 carbon atoms: R2 is H or a -SO2-NH-NH2, in which case R1 is H7 and symmetric sulfonylhydrazides of the general formulae: Image or Image where. x is -O-, -S-, -CH2- or -SO2- and mixtures thereof to the polymer resin. Products made by adding the hydrazides to the resins are also disclosed.
289159
Gowling Lafleur Henderson Llp
Labofina S.a.
LandOfFree
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