Process for the aftertreatment of amphoteric or zwitterionic...

Details Process for the aftertreatment of amphoteric or zwitterionic... Process for the aftertreatment of amphoteric or zwitterionic...

C - Chemistry, Metallurgy

07

C

C07C 227/40 (2006.01) C07C 231/24 (2006.01)

Patent

CA 2069938

2069938 9108193 PCTABS00005 The residual content of free alkylating agent in aqueous solutions of amphoteric or zwitterionic surface-active agents can be significantly lowered by treatment with ammonia, an amino with 2-8 carbon atoms or an oligopeptide.

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