Process for the application of a light-blocking layer...

G - Physics – 02 – F

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G02F 1/1335 (2006.01) C23C 16/30 (2006.01) G02F 1/135 (2006.01)

Patent

CA 2301457

1. Process for the application of a light-blocking layer between photo-conducting layer and mirror in the manufacture of an optically addressable spatial light modulator OASLM 2Ø Abstract 2.1. The process according to the invention relates to the targeted influencing of the properties of the light-blocking layer to be produced. 2.2. According to the invention, the application of the light-blocking layer (4) and the application of the photoconducting layer (3) are performed in a common process step in which both the thickness and composition of the photoconducting layer (3) to be applied to the transparent electrode (2) and also the thickness and composition of the light-blocking layer (4) to be applied to the photoconducting layer (3) are determined by a time-related change of the variation of the gas composition during the deposition process. 2.3. The structure of the optically addressable spatial light modulators OASLMs can be optimally adapted to the envisaged application on the basis of the process according to the invention. This makes it possible to manufacture OASLMs with multi-layer structures. 3Ø Fig. 1

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