Process for the chemical spray etching of a substrat

B - Operations – Transporting – 41 – J

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B41J 27/00 (2006.01) C30B 23/02 (2006.01)

Patent

CA 2183099

Pour facilier la reprise d'épitaxie par jets moléculaires après gravure d'un substrat ou d'une couche épitaxiale, le procédé de gravure s'effectue dans l'utravide et consiste à produire au moins deux jets chimiques simultanés et convergeant vers le substrat ou la couche, les jets étant formés de substances capables de réagir chacun avec des éléments du substrat ou de la couche de natures différentes pour former des composés volatils. Application notamment à la fabrication de composants photoniques et optoélectroniques.

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