Process for the development of exposed light-sensitive...

Details Process for the development of exposed light-sensitive... Process for the development of exposed light-sensitive...

G - Physics

03

C

96/269

G03C 5/18 (2006.01) G03F 7/32 (2006.01)

Patent

CA 1145190

Hoe 78/K 051 PROCESS FOR THE DEVELOPMENT OF EXPOSED LIGHT-SENSITIVE PRINTING PLATES BASED ON O-NAPHTHOQUINONE-DIAZIDES Abstract of the Disclosure An improvement in the process for the development of ex- posed light-sensitive printing plates having a support of anodi- cally oxidized aluminum and a light-sensitive coating which con- tains an o-naphthoquinone-diazide and an alkali-soluble; resin, wherein the exposed areas of the coating are washed off with an aqueous-alkaline developer solution, the improvement comprising that the development is effected in the presence of an ionizable compound of an clement of the groups IIa, IIIa or IIIb of the Periodic Table. The ionizable compound can be contained in the developer solution or in the printing plate, and it has the effect of reducing the attack on the oxide layer.

333265

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