Process for the formation of miniaturized getter deposits...

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H01L 21/027 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2602808

A process for the formation of miniaturized getter deposits is described, comprising the steps of: forming a layer (11) of a photosensitive polymeric material on a support (10); selectively exposing the polymeric layer in order to cause a chemical modification in a portion of the polymeric layer; removing with a solvent only one between the previously exposed or the not previously exposed portion of the polymeric layer, thus forming cavities (12, 12', ...) in the polymeric layer; forming a thin layer (13) of a getter material through cathodic deposition at the bottom of said cavity and on the residual polymer; and removing with a second solvent the polymer portion not removed by the first solvent, leaving at least a getter material deposit (131, 131', ...; 20) on the support surface. The invention also relates to miniaturized getter deposits obtained through this process.

L'invention concerne un procédé de formation de dépôts de getter miniaturisés, comprenant les étapes consistant à : former une couche (11) d'une matière polymère photosensible sur un support (10) ; exposer sélectivement la couche de polymère afin d'induire une modification chimique dans une partie de la couche de polymère ; enlever avec un solvant seulement la partie exposée antérieurement ou non exposée antérieurement de la couche de polymère, et former ainsi des cavités (12, 12') dans la couche de polymère ; former une fine couche (13) d'une matière getter par dépôt cathodique au fond de ladite cavité et sur le polymère résiduel ; et enlever avec un second solvant la partie de polymère non enlevée par le premier solvant, laisser au moins un dépôt de matière de getter (131, 131' ; 20) sur la surface de support. L'invention porte également sur des dépôts de getter miniaturisés obtenus par ledit procédé.

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