C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 133/10 (2006.01) H01J 1/54 (2006.01) H01J 9/20 (2006.01) H01J 29/28 (2006.01)
Patent
CA 2047116
PROCESS FOR THE FORMATION OF UNDERCOAT FOR CRT METAL BACK LAYER Abstract of the Disclosure A process is described for the formation of an undercoat which is in turn useful in forming a CRT met- al back layer. According to the process, a pretreat- ment composition is coated on a glass panel having a fluorescent layer overlaid thereon, so that a water film is formed. The pretreatment composition is com- posed of 2-20 wt.% of an alkyl monoalcohol having a C1- 3 alkyl group, 0.05-1 wt.% of a water-soluble, high molecular compound and 79-97.95 wt.% of water. An un- dercoating composition is then coated on the water film by a wet-on-wet coating method, whereby a coating layer is formed. The undercoating composition is composed of 1-7 parts by weight of an acrylic resin, which has been obtained by polymerizing 90-100 wt.% of an alkyl methacrylate having a C1-4 alkyl group other than tert- butyl methacrylate and 0-10 wt.% of an ethylenically unsaturated monomer copolymerizable therewith, and 99- 93 parts by weight of a solvent containing at least 80 wt.% of toluene. The sum of the acrylic resin and the solvent is 100 parts by weight. The water film and the coating layer are dried to form the undercoat.
Ikegami Yukihiro
Ishiguro Kiichiro
Itakura Masanori
Osaka Norihisa
Tokuda Shuichiro
Finlayson & Singlehurst
Mitsubishi Rayon Co. Ltd.
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