Process for the manufacture of at least one ethylene...

C - Chemistry – Metallurgy – 07 – C

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C07C 17/02 (2006.01) C07C 17/156 (2006.01) C07C 17/25 (2006.01) C07C 19/045 (2006.01) C07C 21/06 (2006.01)

Patent

CA 2725630

Process for the manufacture of at least one ethylene derivative compound starting from a low value residual gas, preferably a ROG, according to which : a) the low value residual gas is subjected to a series of treatment steps in a low value residual gas recovery unit in order to remove the undesirable components present therein and to obtain a mixture of products containing ethylene and other constituents; b) the said mixture of products is fractionated in one fractionation step into one fraction containing almost all the ethylene (fraction A), optionally into one individual fraction of ethane and into one heavy fraction (fraction C); and c) fraction A is conveyed to the manufacture of at least one ethylene derivative compound.

Linvention concerne un procédé de fabrication dau moins un composé dérivé déthylène à partir dun gaz résiduaire de faible valeur, de préférence un GOR. Selon le procédé : a) le gaz résiduaire de faible valeur est soumis à une série détapes de traitement dans une unité de récupération de gaz résiduaire de faible valeur afin den enlever les composants indésirables et dobtenir un mélange de produits contenant de léthylène et dautres constituants; b) ledit mélange de produits est fractionné dans une étape de fractionnement en une fraction contenant presque la totalité de léthylène (fraction A), facultativement en une fraction individuelle déthane et en une fraction lourde (fraction C); et c) la fraction A est acheminée vers la fabrication dau moins un composé dérivé de léthylène.

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