C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/179, 260/312
C07D 257/04 (2006.01) C07C 103/42 (1985.01) C07C 121/76 (1985.01)
Patent
CA 1265148
21489-6843 Abstract 4-Arylresorcinol ethers of the formula Image (I) in which R1 is lower alkyl, R2 is fluorinated lower alkyl, R3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is un- interrupted or interrupted by oxygen, one of the radicals R4, R5 and R7 is a group of the formula -NH-C(=O)-R8, a radical R4 or R5 which differs from this is a radical R9 and a radical R7 which differs from this is a radical R10, R6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esteritied or amidated, cyano or lower alkanoyl, R8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties. They are prepared, for example, by reacting compounds of the formulae Image in which one of the radicals X5 and X6 is hydroxyl which is free or in salt form and the other is a radical -O-alkH substituted by reactive esterified hydroxyl or epoxy.
495750
Beck Andreas
Lang Robert Werner
Sallmann Alfred
Wenk Paul
Ag Ciba-Geigy
Fetherstonhaugh & Co.
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