C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.1, 260/4
C07C 69/76 (2006.01) C07C 59/54 (2006.01)
Patent
CA 1039300
Abstract of the Disclosure Compounds of the general formula 1 Image (I) wherein one of the two radicals R1 and R2 denotes the acyl radical R-C(=O)- of a carboxylic acid of aromatic character and the other denotes a group Ro which represents hydrogen or optionally esterif- ied or etherified hydroxyl, R3 denotes hydrogen. lower alkyl or lower hydroxyalkyl, R4 denotes optionally esterified or amidised carboxy, m denotes 1 or 2 and n denotes 0 or 1, in the free form or in the form of their therapeutically acceptable salts. The new compounds are useful as antiphlogistics, mild analgesics, antipyretics and as anti-rheumatic agents. The new compounds can be manufactured by methods known per se and suitable such methods are described.
219900
Haas Georges
Rossi Alberto
Ag Ciba-Geigy
Na
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