C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/305
C07D 233/60 (2006.01) C07D 213/61 (2006.01) C07D 213/74 (2006.01) C07D 233/54 (2006.01) C07D 277/26 (2006.01)
Patent
CA 1070315
ABSTRACT OF THE DISCLOSURE A compound of the formula Image wherein X3 and X4, which may be the same or different, are NY wherein Y is hydrogen, lower alkyl, or cyano; R3 and R4 which may be the same or different, each represent a grouping of the structure Het-(CH2)mZ(CH2)n- where Het is 4-imidazolyl, or a 4-imidazolyl ring substituted by lower alkyl, or is 2-thiaszolyl; Z is sulphur; m is 1 and n is 2; W is NH, and when X3 and X4 are both NH, W may also be sulphur; and p is an integer from 9 to 12; or a pharmaceutically acceptable acid addition salt thereof is provided herein by means of an addition reaction and optionally a further hydrolysis reaction. These compounds are useful as histamine H2-antagonist, which are useful as inhibitors of gastric acid secretion, as antiinflammatory agents, and as agents, and as agents which act on the cardiovascular system.
283619
Durant Graham J.
Ganellin Charon R.
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