C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 271/20 (2006.01) C07C 213/00 (2006.01) C07C 215/28 (2006.01) C07C 217/58 (2006.01) C07C 225/16 (2006.01) C07C 233/36 (2006.01) C07C 233/78 (2006.01) C07C 251/40 (2006.01) C07C 255/42 (2006.01) C07C 269/06 (2006.01) C07D 209/44 (2006.01) C07D 221/14 (2006.01)
Patent
CA 2174000
Intermediates and processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or R6 is as defined above and R7 is R7aOC (O)-wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen and trifluoromethyl and R8 is hydrogen or -C(O)R" wherein R" is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
L'invention porte sur des intermédiaires et des procédés servant à la préparation d'un composé sensiblement pur de formule (I) où R¿6? et R¿7? sont tous deux hydrogène ou bien R¿6? et R¿7? sont choisis indépendamment dans (i), où R¿a? et R¿b? sont choisis indépendamment entre hydrogène, alkyle inférieur et phényle, et R¿c?, R¿d? et R¿e? sont choisis indépendamment entre hydrogène, alkyle inférieur, trifluorométhyle, alcoxy, halo et phényle et (ii), où le cycle naphtyle est non substitué ou substitué par un, deux ou trois substituants choisis indépendamment entre alkyle inférieur, trifluorométhyle, alcoxy et halo; ou R¿6? est tel que défini ci-dessus et R¿7? est R¿7a? OC(O)- où R¿7a? est alkyle inférieur ou benzyle; ou R¿6? et R¿7? pris ensemble avec l'atome d'azote auxquels ils sont fixés sont (iii) ou (iv) où R¿f?, R¿g?, R¿h? et R¿i? sont choisis indépendamment entre hydrogène, alkyle inférieur, alcoxy, halogène et trifluorométhyle, et R¿8? est hydrogène ou - C(O)R'' où R'' est alkyle inférieur, alcoxy, benzyloxy ou phényle où le cycle phényle est non substitué ou substitué par un, deux ou trois substituants choisis indépendamment entre alkyle inférieur, trifluorométhyle, alcoxy et halo; ou l'un de leurs sels acides additionnels.
Allen Michael S.
Haight Anthony R.
Kerdesky Francis A. J.
Langridge Denton C.
Leanna M. Robert
Abbott Laboratories
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
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