C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/101, 260/555
C07D 501/16 (2006.01) C07C 237/06 (2006.01) C07D 498/08 (2006.01) C07D 519/06 (2006.01)
Patent
CA 1339738
A cephem derivative represented by the following formula: (see fig. I) wherein R1 means a fluorine-substituted lower alkyl and A1 denotes a cyclic or acyclic ammonio group, or a non-toxic salt thereof, is prepared by reacting a compound represented by the following formula: (see fig. II) wherein A1 has the same meaning as defined above, with another compound represented by the following formula: (see fig. III) wherein R1 has the same meaning as defined above, and if necessary, removing the protecting groups.
593761
Kai Yasunobu
Kamiya Takashi
Katsu Kanemasa
Komatu Yuuki
Naito Toshihiko
Eisai Co. Ltd.
Marks & Clerk
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