C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/385, 260/356
C07D 311/16 (2006.01) C07D 311/18 (2006.01) C07D 311/22 (2006.01) C07D 311/30 (2006.01) C07D 405/04 (2006.01)
Patent
CA 1194493
Abstract of The Disclosure New benzopyrane derivatives of the general formula Image (I) in which R is free, esterified or amidated carboxyl, Ph is 1,2-phenylene which contains the group R-CO-NR3- and is other- wise unsubstituted or is substituted, X is a group of the formula -CO-CR1=CR2-7 in which R1 and R2 irdependently of one another are hydrogen, acyl or a substitutcd or unsubstituted hydrocarbon radical or a hetero-analogue thereof, or conjointly are 3- membered to 5-membered lower alkylene, and R2 can also be free or etherified hydroxyl or hydroxyl esterified by an organic carboxylic acid, and R3 is hydrogen or lower alkyl, in the free form or in the form of a salt are useful as anti-allergic agents. The compounds of the general formula I can be manufactured by methods known per se and suitable such methods are described.
285698
Fetherstonhaugh & Co.
Novartis Ag
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